AN 9034 - the Application of Infrared Microimaging to the Measurement of Photoresist Thickness
Description:
In recent years, infrared microspectroscopy has progressed from an esoteric and difficult technique to a routine method of analysis. This is due to the merger of highly sensitive Fourier transform infrared spectrometers with precision infrared and optical microscopes.
Environment:
FT-IR
Attachment(s):
| File | Last Modified |
|---|---|
| AN 9034 - the Application of Infrared Microimaging to the Measurement of Photoresist Thickness.pdf | August 03, 2022 |